本发明公开一种基于高功率脉冲磁控溅射技术的TiN/TiO₂/α‑Al₂O₃涂层制备方法，其特征在于，包括以下步骤：S1、对基体进行离子清洗；S2、停在Ti靶前，功率为8‑15kW的脉冲反应溅射获得TiN过渡层；S3、再停在Ti靶前，功率为10-15kW脉冲反应溅射获得TiO₂过渡层；S4、再停在Al靶前，高功率脉冲反应溅射获得α‑Al₂O₃层，即得。本发明综合利用了高功率脉冲磁控溅射制备的TiN/TiO₂/α‑Al₂O₃涂层具有高硬度、高热稳定性和低摩擦系数的优点，得到的多层涂层的硬度可达到27GPa以上，同时具有低于0.1的摩擦系数，具有较高的热稳定性和化学稳定性。

The present invention discloses a TiN/TiO₂ based on high power pulse magnetron sputtering technology/ α‑ A preparation method for Al₂O₃ coating, characterized in that it comprises the following steps: S1, ion cleaning of the substrate; S2. Stop in front of the Ti target and obtain a TiN transition layer by pulsed reactive sputtering with a power of 8-15kW; S3, stop in front of the Ti target again, and pulse reactive sputtering with a power of 10-15kW to obtain a TiO₂ transition layer; S4. Stop in front of the Al target again and obtain high-power pulse reactive sputtering α‑ Al₂O₃ layer is obtained. The present invention comprehensively utilizes TiN/TiO₂ prepared by high-power pulse magnetron sputtering/ α‑ Al₂O₃ coating has the advantages of high hardness, high thermal stability, and low friction coefficient. The resulting multi-layer coating has a hardness of over 27GPa and a friction coefficient of less than 0.1, exhibiting high thermal and chemical stability.