本发明采用高功率脉冲磁控溅射技术，在每个高能量负脉冲周期尾段施加一个反向的正脉冲信号，通过调节脉冲参数、控制Ar流量和温度精确控制得到优化的ta-C涂层，所制备ta-C涂层硬度达到30Gpa以上，同时具有低于0.1的摩擦系数，具有较好的润滑性能。本发明综合利用带有反向正脉冲技术和高功率脉冲磁控溅射制备四面体非晶碳ta-C高硬度和低摩擦系数的优点，得到了兼具高硬度和低摩擦的涂层。

The present invention adopts high-power pulse magnetron sputtering technology, applies a reverse positive pulse signal at the end of each high-energy negative pulse cycle, and obtains an optimized ta-C coating by adjusting pulse parameters, controlling Ar flow rate, and precisely controlling temperature. The prepared ta-C coating has a hardness of over 30Gpa, a friction coefficient below 0.1, and good lubrication performance. The present invention comprehensively utilizes the advantages of high hardness and low friction coefficient of tetrahedral amorphous carbon ta-C prepared by reverse positive pulse technology and high-power pulse magnetron sputtering, which obtains a coating that combines high hardness and low friction.